• Sourcing Solutions
  • Services & Membership
  • Help & Community

Quick Details

  • Machine Type: Other
  • Condition: New
  • Place of Origin: Anhui, China (Mainland)
  • Brand Name: HB
  • Model Number: HB-PCL-10L-B
  • Feature: Critical Cleaning / Residue Free
  • Certification: CE, UL
  • Use: surface modification treatment of substrate, granular material
  • Cleaning Type: plasma cleaning
  • Industry Used: Electronic Industry
  • Material: Glass / Ceramic
  • Power(W): 200-400W
  • After-sales Service Provided: Engineers available to service machinery overseas
  • Name: wafer cleaning
  • capacity: 10L
  • frequency offset: less than 0.2 khz
  • display mode: LCD
  • Gas flow: 10-100ml/min

Packaging & Delivery

Packaging Details wooden case
Delivery Time Prompt delivery

Multi-function laboratory plasma wafer cleaning


Application of wafer cleaning

1.Car industry: ignition coil engine oil seal film
2.Defense industry: Aerospace electrical connectors,Kevlar deal
3.Electronics industry: hard plastic parts, earphone, Cell phone cover
4.Medical industry: intravenous infusion, catheter treatment
5.Textile fiber,rubber and plastic industry and etc


Featrues of wafer cleaning

1. Environmental technologies: plasma process is the role of gas - solid coherent reactor consumes no water resources, no need to add chemicals and no environmental pollution.
2. Wide adaptability: 
regardless of processing substrate type, such as metals, semiconductors, oxides, and most of the polymer material can be a good deal;
3. Low temperature: 
close to room temperature, particularly suitable polymer materials, have a longer retention time and a higher surface tension than the corona and flame method.
4. Multifunctions: 
it involves only a shallow surface of polymer materials (10 -1000A), while preserving the characteristics of the material itself can give it one or more  new features;
5. Low cost: 
the device is simple, easy operation and maintenance, continuous operation,a few bottles of gas can replace thousands of kilograms cleaning fluid
6. The whole process technology can be controlled: 
all the parameters can be setted by the computer and data recording
7. Treated geometry Unlimited: 
Big or small, simple or complex, parts or textiles can be processed.


Technical parmaters of wafer cleaning


Model HB-PCL-10L-B
Working current:Total working current not higher than 2A (Not include the vacuum pump)
RF frequency13.56MHz
RF power200-400W
Frequency offset<0.4KHz
Vacuum degree60Pa-100Pa
Cleaning time1-6000s adjustable
Gas flow>10-100ml
Process Controlmanually/automatic
Cleaning capacity10L
Exhaust pipeKF vacuum flange+vacuum aluminum pipe
Vacuum PumpBipolar direct rotary vane pump
Impedance matchingautomatic
Power supplyAC 220V 60Hz


Transaction History of the Supplier

Below is the information about the supplier's transactions conducted via Alibaba.com. If you require further details regarding the transaction data, please contact the supplier directly.

Transaction Overview


Transaction Details

This supplier has completedtransactions with buyers from .

Shipping Destination
Transaction Value
Transaction Date
Email to this supplier
Trade Assurance
China (Mainland) | Trading Company
Transaction Level:
Supplier Assessments:
17 Transactions 10,000+
The supplier’s transactions conducted via Alibaba.com in the past 6 months.
The supplier supports Trade Assurance – A free service that protects your orders from payment to delivery.
Supplier's Trade Assurance Limit: US $46,000
Learn More