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Quick Details

  • Machine Type: Other
  • Condition: New
  • Place of Origin: Anhui, China (Mainland)
  • Brand Name: HB
  • Model Number: HB-PCL-10L-B
  • Feature: Critical Cleaning / Residue Free
  • Certification: CE, UL
  • Use: surface modification treatment of substrate, granular material
  • Cleaning Type: plasma cleaning
  • Industry Used: Electronic Industry
  • Material: Glass / Ceramic
  • Power(W): 200-400W
  • After-sales Service Provided: Engineers available to service machinery overseas
  • Name: wafer cleaning
  • capacity: 10L
  • frequency offset: less than 0.2 khz
  • display mode: LCD
  • Gas flow: 10-100ml/min

Packaging & Delivery

Packaging Details wooden case
Delivery Time Prompt delivery

Multi-function laboratory plasma wafer cleaning

 

Application of wafer cleaning

1.Car industry: ignition coil engine oil seal film
2.Defense industry: Aerospace electrical connectors,Kevlar deal
3.Electronics industry: hard plastic parts, earphone, Cell phone cover
4.Medical industry: intravenous infusion, catheter treatment
5.Textile fiber,rubber and plastic industry and etc

 

Featrues of wafer cleaning

1. Environmental technologies: plasma process is the role of gas - solid coherent reactor consumes no water resources, no need to add chemicals and no environmental pollution.
2. Wide adaptability: 
regardless of processing substrate type, such as metals, semiconductors, oxides, and most of the polymer material can be a good deal;
3. Low temperature: 
close to room temperature, particularly suitable polymer materials, have a longer retention time and a higher surface tension than the corona and flame method.
4. Multifunctions: 
it involves only a shallow surface of polymer materials (10 -1000A), while preserving the characteristics of the material itself can give it one or more  new features;
5. Low cost: 
the device is simple, easy operation and maintenance, continuous operation,a few bottles of gas can replace thousands of kilograms cleaning fluid
6. The whole process technology can be controlled: 
all the parameters can be setted by the computer and data recording
7. Treated geometry Unlimited: 
Big or small, simple or complex, parts or textiles can be processed.

 

Technical parmaters of wafer cleaning

 

Model HB-PCL-10L-B
Working current:Total working current not higher than 2A (Not include the vacuum pump)
RF frequency13.56MHz
RF power200-400W
Frequency offset<0.4KHz
Vacuum degree60Pa-100Pa
Cleaning time1-6000s adjustable
Gas flow>10-100ml
Process Controlmanually/automatic
Power10-100%adjustable
Cleaning capacity10L
Exhaust pipeKF vacuum flange+vacuum aluminum pipe
Vacuum PumpBipolar direct rotary vane pump
Impedance matchingautomatic
DisplayLCD
Power supplyAC 220V 60Hz

 

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China (Mainland) | Trading Company
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6 Transactions 10,000+
The supplier’s transactions conduted via Alibaba.com in the past 6 months.
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Supplier's Trade Assurance Limit: US $45,000
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